| Journal Rank | 8958 |
|---|---|
| Impact Score | 3.77 |
| H-Index | 72 |
| SJR | 0.577 |
Plasma chemistry and plasma processing is a reputed research journal publish the research in the field/area related to Chemical Engineering (miscellaneous) (Q2); Chemistry (miscellaneous) (Q2); Condensed Matter Physics (Q2); Surfaces, Coatings and Films (Q2). It is published by Springer New York. The journal has an h-index of 72. The overall rank of this journal is 8958. The more details like ISSN, Journal Quartile, SJR Score, ISSN, and other important details are provided in the following section.
| Journal Title | Plasma Chemistry and Plasma Processing |
|---|---|
| Publisher | Springer New York |
| ISSN | 02724324, 15728986 |
| SJR | 0.577 |
| H-Index | 72 |
| Country | United States |
| Quartile | Q2 |
| Online Submission | Submit |
The latest impact score of Plasma chemistry and plasma processing is 3.77.
Credit & Source: Scopus.