| Journal Rank | 17150 |
|---|---|
| Impact Score | 0.69 |
| H-Index | 17 |
| SJR | 0.243 |
International journal of rf technologies: research and applications is a reputed research journal publish the research in the field/area related to Electrical and Electronic Engineering (Q3); Industrial and Manufacturing Engineering (Q3); Management Information Systems (Q3); Management of Technology and Innovation (Q3). It is published by IOS Press BV. The journal has an h-index of 17. The overall rank of this journal is 17150. The more details like ISSN, Journal Quartile, SJR Score, ISSN, and other important details are provided in the following section.
| Journal Title | International Journal of RF Technologies: Research and Applications |
|---|---|
| Publisher | IOS Press BV |
| ISSN | 17545749, 17545730 |
| SJR | 0.243 |
| H-Index | 17 |
| Country | Netherlands |
| Quartile | Q3 |
| Online Submission | Submit |
The latest impact score of International journal of rf technologies: research and applications is 0.69.
Credit & Source: Scopus.
